Suction Chuck for Double-sided exposure machine (Aligner)
Auto Exposurer 3", 4", 5", 6" 300-CC This equipment is a photomask alignment exposure machine used in semiconductor lithography process.
Function: Use UV parallel light source to make 1:1 copy of the pattern of the photomask to the photoresist film on the wafer surface.
■ Equipment Specifications:
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Exposure light source , mask line width reproduction capability , I-line positive photoresist 1um thickness, hard contact, 1um~2um,
proximity 3um~5um.
■ Align the imaging system:
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Automatic alignment ability, the align key with clear geometric shape can be identified within 5um.
■ production can:
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For the alignment process , the exposure time is 3 seconds, and the mechanical capacity is 250 to 300 pieces per hour (without considering the material variability).
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No alignment, only exposure process, exposure time of 3 seconds, mechanical capacity of 280~360 pieces per hour (without considering material variability and unloading).
■ External Dimensions Weight:
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W: 1900 x D1600 x H2400mm
■ heavy quantity:
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Weight about 1900kg
There are 6 adjustment screws on the side, which can easily align the upper and lower masks
Double-sided Exposure Suction Cup
LI06D
Double-sided exposure suction cup
Machine name Model：LI06D
■ Varnish suction cup :
There are six adjustment screws on the side, which can be
easily aligned with the upper and lower light cover.
■ Positioning Pins :
The upper and lower photomask can be easily reused with two
pins on the opposite corners of the photomask.
■ External dimensions :
W : 1600 x L. 1600 x H. 2500 mm
■ Weight :
Weight about 0.7kg
Model Type：LI06D
