Suction Chuck for Double-sided exposure machine (Aligner)

Auto Exposurer 3", 4", 5", 6" 300-CC This equipment is a photomask alignment exposure machine used in semiconductor lithography process.

Function: Use UV parallel light source to make 1:1 copy of the pattern of the photomask to the photoresist film on the wafer surface.

■ Equipment Specifications:

• Exposure light source , mask line width reproduction capability , I-line positive photoresist 1um thickness, hard contact, 1um~2um,proximity 3um~5um.

■ Align the imaging system:

• Automatic alignment ability, the align key with clear geometric shape can be identified within 5um.

■ production   can:

• For the alignment process , the exposure time is 3 seconds, and the mechanical capacity is 250 to 300 pieces per hour (without considering the material variability).
• No alignment, only exposure process, exposure time of 3 seconds, mechanical capacity of 280~360 pieces per hour (without considering material variability and unloading).

■ External Dimensions Weight:

• W: 1900 x D1600 x H2400mm

■ heavy   quantity:

• Weight about 1900kg

There are 6 adjustment screws on the side, which can easily align the upper and lower masks

Double-sided Exposure Suction Cup

LI06D

■Double-sided exposure suction cup

• Machine name Model：LI06D

■ Varnish suction cup :

• There are six adjustment screws on the side, which can be easily aligned with the upper and lower light cover.

■ Positioning Pins :

• The upper and lower photomask can be easily reused with two pins on the opposite corners of the photomask.

■ External dimensions :

• W : 1600  x L. 1600  x H.  2500 mm

■ Weight :

• Weight about 0.7kg